The rapid increase in demand for AI semiconductors has significantly intensified heat generation issues due to higher integration density and increased computational workloads.
Conventional thermal measurement technologies face inherent limitations in analyzing low-dimensional materials, making them inadequate for precise thermal management of high-performance semiconductors. As a result, there is an urgent need for ultra-precise thermal property measurements to resolve overheating issues and ensure stable performance of AI semiconductors.
HeatMetricX has developed ultra-precise thermal property measurement sensors and systems based on nano/micro devices, enabling thermal characterization of low-dimensional materials for high-performance semiconductors with a precision of ±0.001°C.
| Technology | Measurement Principle | Measurable Sample Size |
|---|---|---|
| Laser Flash Method | Indirect thermal conductivity measurement based on thermal diffusivity Requires surface treatment of samples |
cm-scale |
| Hot Disk Method | Indirect thermal conductivity measurement based on thermal diffusivity | cm-scale |
| AC Lock-in Technique with Customized Micro Devices (HeatMetricX) | Direct thermal conductivity measurement | Down to nm-scale |

Prototype of the measurement system

Example of thermal conductivity analysis of low-dimensional samples such as polymer nanowires with diameters of approximately 40 nm
The HeatMetricX Lock-in platform is built on ultra-precise micro thermal sensors and circuit technologies that overcome the limitations of existing approaches, providing a strong foundation for market entry and scalable expansion
| Category | Thermocouple | IR Camera | Laser Flash | HeatMetricX |
|---|---|---|---|---|
| Measurement Method | Contact-based, single-point | Non-contact, image-based | Heat transfer model-based | MEMS-based |
| Precision | 0.001°C | 0.1°C | 0.01°C | 0.001°C |
| Measurement Target | Single point | Surface temperature | Homogeneous materials | Internal thermal distribution including microstructures |
| Limitations | Not suitable for multi-point or microstructure measurements | Cannot measure internal thermal distribution | Not suitable for heterogeneous or multilayer structures | Optimized for Chiplet and HBM package analysis |
| Remarks | - | - | - | Includes data analysis and process optimization services |